Rethinking the future of chips

In imprint lithography, a transparent template is used as a mold to create a circuit pattern in a silicon wafer.

Credit: Molecular Imprints

VAPORIZATION SUBSTRATE OF "DOPED" MATERIAL=90 NM.
by April 19, 2005 10:11 AM PDT: ALTHOUGH YOUR PICTURES MAY BE TRUE, FROM MY KNOWLEDGE 90 NM REFERS TO THICKNESS OF VAPORIZED "DOPED" MATERIAL THAT SETTLES ON SILICA INSULATE MATERIAL. PERHAPS THIS PROCESS FORMS "MASK" THAT IS "WASHED" OUT AFTER VAPORIZATION, THAT CONTROLS WHERE "DOPED" MATERIAL SETTLES DURING VAPORIZATION, WASHED, THEN NEXT LAYER APPLIED, MASKED, DOPED, WASHED, UNTIL TOTAL NUMBER OF "TRANSISTORS" HAVE BEEN APPLIED.
SIGNED:PHYSICIAN THOMAS STEWART VON DRASHEK M.D.; Like this Reply to this comment

Roadmap to a dead end street
by ASML burke December 26, 2006 1:35 AM PST: Sure, we have pushed the lithographic boundary to even smaller geometries. Now, ASML want to sell us on the idea of a Microlithography immersion system. Lets take another look at this. Is it better to build 65nm highways for electrons drivers to travel. Or maybe its time to change drivers, photons traveling on highways of light are much earier to build.; Like this Reply to this comment

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